宏宇賴

Chang-hua,CHA

Summary

Lithography Process Engineer with 4+ years of experience in advanced semiconductor manufacturing at Micron. Proven track record in scanner optimization, process improvement, and high-volume production ramp. Strong expertise in ASML and Canon KrF lithography systems, with demonstrated impact on capacity expansion, overlay improvement, and defect reduction. Experienced in leading cross-functional projects and driving measurable business results.

Overview

years of professional experience

Work History

Micron Technology, Inc.

Photo Process Engineer

Taiwan, MTTW

07.2022 - Current

Led multiple critical-layer process optimization projects, improving production capacity by 30+ WPD across lithography fleet.
Drove BST (Back Side Test) conversion to eliminate defect sources, increasing output by ~6 WPD and improving process stability.
Led FOAK (First-of-a-Kind) product qualification, achieving 100% qualification success and contributing ~4 WPD capacity gain.
Owned ASML XT860 platform (3 tools) process qualification and release, enabling >4750 WPD production capacity.
Executed multi-layer shot reduction strategy, achieving full conversion and improving throughput by 33+ WPD across fleet.
Led Canon scanner hardware upgrade (5 tools), improving overlay performance and saving 400+ labor hours annually.
Improved overlay accuracy by ~4 nm through process optimization and tool parameter tuning.
Drove KrF process optimization (PEP output tuning), achieving ~2% WPD improvement.
Led 6 Canon new tools rapid qualification and release, enabling >5000 WPD production capacity.
Acted as technical owner for lithography tools, leading cross-functional collaboration with equipment, integration, and manufacturing teams.

ASML Taiwan Ltd

Customer Support Engineer

ASML Tainan Office

08.2021 - 07.2022

Supported DUV lithography systems in high-volume semiconductor fab, resolving equipment and process issues.
Improved tool productivity and stability through troubleshooting and process correction.
Collaborated directly with customers to optimize scanner performance and minimize downtime.

Education

Associate of Science - Thesis: Binary Alloy Catalysts For Alkaline Anion

National Chung Hsing University (NCHU)

06-2021

Skills

Lithography: KrF Process, Overlay (OVL), CD Control, Defect Reduction
Equipment: ASML XT, NXT Series, Canon Scanners
Process Expertise: Process Optimization, Yield Improvement, Productivity Enhancement
Analysis: Root Cause Analysis, Data-Driven Problem Solving
Tools: Statistical Analysis, Process Monitoring

Additional Information

Strong ownership mindset with proven ability to lead complex technical projects.
Experience working in high-volume semiconductor manufacturing environments.

Languages

English

Full Professional

Chinese (Mandarin)

Native or Bilingual

Timeline