Kao Shen-Yuan
CMP R&D Leader
Taipei
Summary
Formulation Scientist with cross-material expertise in advanced CMP slurry and post-CMP cleaner development for Ox, SiN, Poly-Si, Cu, W, and Ag applications. Skilled in multiple abrasive systems design, surface-chemistry tuning, and chemical analysis to optimize removal rate, selectivity, corrosion suppression, profile planarity, and defect reduction. Established mechanism-driven analytical workflows integrating colloidal science and surface characterization to deliver robust, scalable solutions for complex CMP process challenges.
Overview
6
6
years of professional experience
Work History
CMP R&D Leader
JSR Electronic Materials Taiwan Co., Ltd.
04.2025 - Current
- Designed advanced CMP slurry/ post CMP cleaner formulations across Ox bulk, SiN buff, Poly-Si bulk, Ceria-based, and platen cleaner applications.
- Developed robust solutions and methodologies to resolve process issues, e.g. removal rate optimization, selectivity tuning, metal corrosion, EoE, planarity, topography controlling, defects, etc.
- Established comprehensive analytical workflows to elucidate the mechanisms of platen cleaner and accelerate root-cause diagnosis.
CMP R&D Deputy Leader
JSR Electronic Materials Taiwan Co., Ltd.
09.2021 - 03.2025
- Designed advanced CMP slurry formulations across SiN buff, Ag bulk & buff, W bulk, Cu bulk, Cu barrier, and novel-abrasive applications.
- Researched new chemical additives to resolve abrasive dispersion, slurry stability, metal corrosion inhibition, profile control issues.
- Engineered and studied the novel abrasive for the mechanism of specific metal wafers.
- Awarded the patent related to metal corrosion inhibition.
Chemical Engineer
Hung Ray New Material Co., Ltd.
11.2019 - 04.2021
- Developed modified PPO polymer materials for PCB 5G applications.
- Polymer monomer design, synthesis and purification.
- Polymer structure identify and analysis.
Education
Master of Science - Chemistry
Fu-Jen Catholic University
New Taipei, Taiwan 04.2001 -
Bachelor of Science - Chemistry
Fu-Jen Catholic University
New Taipei, Taiwan 04.2001 -
Skills
CMP Slurry Formulation Design
Post CMP cleaner Formulation Design
Analytical Workflow & DOE Design
Project planning
Data analysis
Problem-solving
Teamwork and collaboration
Customer service
Timeline
CMP R&D Leader
JSR Electronic Materials Taiwan Co., Ltd.
04.2025 - Current
CMP R&D Deputy Leader
JSR Electronic Materials Taiwan Co., Ltd.
09.2021 - 03.2025
Chemical Engineer
Hung Ray New Material Co., Ltd.
11.2019 - 04.2021
Master of Science - Chemistry
Fu-Jen Catholic University
04.2001 -
Bachelor of Science - Chemistry
Fu-Jen Catholic University
04.2001 -