Wang ShihChuan

• Handle all the RD project and successfully qualified the new strip product to TSMC in 5nm MEOL M0/V0 loop.
• Leads TSMC process support team to support TSMC F18/F12 for 5nm production process ramping and maintenance.
• Generate the baseline data and create lesson learnt to maintain the tool in high AVL.
• 3nm FEOL process development and transferring from RD to future production.

• Improve high temp SPM recipe with customer for wet clean in TSMC N20 FOEL Well loop and UMC N28 Ni-Pt removal
• Reduced down time by analyzed the log and find the issue root cause. Also co-work with technical support to develop the standard trouble shoot procedure
• Played a key role in ensuring customer satisfaction by setting the weekly meeting and maintain the task schedule
• Provide on-site process support and customer training

Advanced process research and development engineer

• Evaluate new process / product such as blue glass and different specification of sapphire cover
• Evaluate the supplier and also assessed subcontractor’s work quality

Etch process engineer

• Etched recipe settings for various types of pattern sapphire substrate
• Yield improvement
• Executed cost down projects

Cleaning process engineer

• Specialized in photo resist stripping and cleaning system
• Implemented quality control and yield improvement