Seasoned Deputy Technical Manager and Principal Engineer with a proven track record at Hitachi High-Tech and TSMC, specializing in semiconductor dry etch process design and optimization. Understanding plasma physics and plasma simulation to assist etching model build up. Expert in recipe tuning and adept at analytical thinking for problem-solving, significantly enhancing production efficiency and innovation.
Semiconductor dry etch process design
Semiconductor dry etch production optimization and line maintain
Design Of Experiment (DOE) and Machine Learning
Semiconductor structure analysis: TEM, SEM, XPS and SIMS
CDSEM monitor recipe set up
COMSOL and Plasma simulation development
Analytical thinking, problem solving and trouble shooting
Dry etcher equipment optimization